Hunan EXWELL Semiconductor Equipment Co., Ltd. Hunan EXWELL Semiconductor Equipment Co., Ltd.

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exwell@exwellsemi.com

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12-inch Vertical High-Temperature Oxidation Annealing Furnace

VCSEL wet oxidation furnace

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12-inch Vertical High-Temperature Oxidation Annealing Furnace

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VCSEL wet oxidation furnace

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Recommended Products

12-inch Vertical High-Temperature Oxidation Annealing Furnace

12-inch Vertical High-Temperature Oxidation Annealing Furnace

Meeting the specifications for 12-inch wafers, this process is used to form a clean, dense SiO2 film layer on silicon substrates; it is applied in devices such as CMOS, IGBT, and MEMS, often serving as an isolation layer, buffer layer, masking layer, or sacrificial layer.

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VCSEL wet oxidation furnace

VCSEL wet oxidation furnace

A wet oxidation process was developed specifically for VCSEL devices to create a dense optical confinement layer and an electrical insulation structure; simultaneously compatible with general wafer surface passivation treatment to meet the dual process requirements of optoelectronic and semiconductor devices.

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High-temperature oxidation furnace

High-temperature oxidation furnace

Used to form a clean and dense SiO2 film layer on a silicon substrate;
It is applied to devices such as CMOS, IGBT, and MEMS, and is often used as an isolation layer, buffer layer, masking layer, sacrificial layer, etc.

Details >

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Hunan EXWELL Semiconductor Equipment Co., Ltd.

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Address: No. 858, Purui West Road, Wangcheng Economic and Technological Development Zone, Changsha City

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