Tubular thermal equipment horizontal furnace
Product Overview
Small-batch, high-precision equipment designed for research institutions and universities. Supports oxidation, diffusion, annealing, and LPCVD processes, combining production, experimental teaching, and process development functionalities.
Product Features
Single-tube small-batch process compatibility: Integrates diffusion, oxidation, annealing, and LPCVD processes, bridging experiments and mass production verification.
Mass production equipment specifications lowered: Retains mass production equipment performance, adapting to university research for process verification from theory to engineering.
Technical Specifications
Wafer Size, Number of Process Tubes8-inch and below 1-4 tubes (Optional)/unit |
Temperature Range200°C-600°C 600°C-1200°C |
Temperature Uniformity≤±1°C |
Constant Temperature Zone Length200~500 mm |
Single-Point Temperature Stability≤ ±0.5°C/24h (1100°C) |
Temperature Ramp CapabilityMaximum Heating Rate 15°C/min |
Application Scenarios
Applicable Materials: Silicon, compound semiconductors, etc.;
Core Processes: PN junction diffusion, LPCVD thin film deposition, high-temperature annealing;
Application Fields: Process R&D in universities and research institutes, pilot production of power devices.
Product Category
Research version
Keyword
EXWELL
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Address: No. 858, Purui West Road, Wangcheng Economic and Technological Development Zone, Changsha City
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